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題名: Dual-ellipsoid type microwave plasma equipment
作者: Huang, W. L.;Chen, S. P.;Lee, Ching-Her;Hsiao, C. S.
貢獻者: 電子工程學系
日期: 2004-08
上傳時間: 2012-05-29T01:25:51Z
摘要: This paper presents a newly developed dual-ellipsoid type microwave plasma cavity. The cavity consists of two half-elliptical-ball chambers and is intended for application in large area carbon nanotube growth. Making use of the focusing characteristic of the elliptical surface, this new microwave plasma cavity can effectively increase the plasma reaction region. With the aid of the High Frequency Structure Simulator (HFSS) software, a dual-ellipsoid type microwave plasma cavity with relatively larger plasma excited region (diameter greater than 10 cm) is designed, fabricated, and tested. Good performance is observed.
關聯: 2004 Int'l Symp. on Antennas and Propagat. (ISAP 2004), Sendai, Japan, Aug. , 2004: 1141-1144
顯示於類別:[電子工程學系] 會議論文

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