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Please use this identifier to cite or link to this item: http://ir.ncue.edu.tw/ir/handle/987654321/10786

Title: Dual-ellipsoid type microwave plasma equipment
Authors: Huang, W. L.;Chen, S. P.;Lee, Ching-Her;Hsiao, C. S.
Contributors: 電子工程學系
Date: 2004-08
Issue Date: 2012-05-29T01:25:51Z
Abstract: This paper presents a newly developed dual-ellipsoid type microwave plasma cavity. The cavity consists of two half-elliptical-ball chambers and is intended for application in large area carbon nanotube growth. Making use of the focusing characteristic of the elliptical surface, this new microwave plasma cavity can effectively increase the plasma reaction region. With the aid of the High Frequency Structure Simulator (HFSS) software, a dual-ellipsoid type microwave plasma cavity with relatively larger plasma excited region (diameter greater than 10 cm) is designed, fabricated, and tested. Good performance is observed.
Relation: 2004 Int'l Symp. on Antennas and Propagat. (ISAP 2004), Sendai, Japan, Aug. , 2004: 1141-1144
Appears in Collections:[電子工程學系] 會議論文

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