This paper presents a time-multiplexed plasma-etching method for high numerical aperture paraboloidal micromirrors. By designing the appropriate opening and spacing of etching windows, one can fabricate micromirror arrays with varying focal lengths within one batch.
關聯:
The 5th Pacific Rim Conference on Lasers and Electro-Optics (CLEO/Pacific Rim 2003), Taipei, Taiwan
