National Changhua University of Education Institutional Repository : Item 987654321/11398
English  |  正體中文  |  简体中文  |  全文笔数/总笔数 : 6507/11669
造访人次 : 30016651      在线人数 : 349
RC Version 3.2 © Powered By DSPACE, MIT. Enhanced by NTU Library IR team.
搜寻范围 进阶搜寻

jsp.display-item.identifier=請使用永久網址來引用或連結此文件: http://ir.ncue.edu.tw/ir/handle/987654321/11398

题名: Electrode Design Optimization of a CMOS Fringing-Field Capacitive Sensor
作者: Li, Yu-Ting;Tzeng, Yen-Lin;Chao, Chih-Ming;Wang, Kerwin
贡献者: 機電工程學系
关键词: Fringing field;Capacitance;Mesh-electrode
日期: 2012-03
上传时间: 2012-06-06T01:44:10Z
出版者: IEEE
摘要: The capacitance of a micro-capacitive-sensor is mainly depends on its electrode structures, electrode arrangement and the dielectric strength of its surrounding. This paper presents a novel electrode design to enhance the fringingfield and to increase the capacitance of a CMOS MEMS
capacitive sensor. The design optimization process is assisted by COMSOL, a multi-physics finite-element simulation tool. The design goal is to maximize the fringing-field of capacitive sensor. The capacitor has been built with a VLSI Schmitt trigger, and temperature compensator to probe the capacitance. The experiment results show that proposed capacitor can achieve the capacitance to 75.2 pF.
關聯: The 7th Annual IEEE International Conference on Nano/Micro Engineered and Molecular Systems (NEMS), Kyoto, Japan, March 5-8, 2012
显示于类别:[機電工程學系] 會議論文

文件中的档案:

档案 大小格式浏览次数
index.html0KbHTML820检视/开启


在NCUEIR中所有的数据项都受到原著作权保护.

 


DSpace Software Copyright © 2002-2004  MIT &  Hewlett-Packard  /   Enhanced by   NTU Library IR team Copyright ©   - 回馈