National Changhua University of Education Institutional Repository : Item 987654321/12272
English  |  正體中文  |  简体中文  |  全文筆數/總筆數 : 6491/11663
造訪人次 : 24748149      線上人數 : 50
RC Version 3.2 © Powered By DSPACE, MIT. Enhanced by NTU Library IR team.
搜尋範圍 進階搜尋

請使用永久網址來引用或連結此文件: http://ir.ncue.edu.tw/ir/handle/987654321/12272

題名: A study on the wet etching behavior of AZO(ZnO:Al) transparent conducting film
作者: Lin, Yi- Cheng;Jian, Y. C.;Jiang, J. H.
貢獻者: 機電工程系
關鍵詞: AZO film;Transparent conducting film;Wet etching;Chemical stability
日期: 2008-02
上傳時間: 2012-07-05T07:10:32Z
出版者: Elsevier B.V.
摘要: This paper studies the wet etching behavior of AZO (ZnO:Al) transparent conducting film with tetramethylammonium hydroxide (TMAH). The optimum optoelectronic film is prepared first using designated RF power, film thickness and controlled annealing heat treatment parameters. The AZO film is then etched using TMAH etchant and AZ4620 photoresist with controlled etchant concentration and temperature to examine the etching process effect on the AZO film optoelectronic properties. The experimental results show TMAH:H2O = 2.38:97.62 under 45 °C at the average etch rate of 22 nm/min as the preferred parameters. The activation energy drops as the TMAH concentration rises, while the etch rate increases along with the increase in TMAH concentration and temperature. After lithography, etching and photoresist removal, the conductivity of AZO film dramatically drops from 2.4 × 10−3 Ω cm to 3.0 × 10−3 Ω cm, while its transmittance decreases from 89% to 83%. This is due to the poor chemical stability of AZO film against AZ4620 photoresist, leading to an increase in surface roughness. In the photoresist postbaking process, carbon atoms diffused within the AZO film produce poor crystallinity. The slight decreases in zinc and aluminum in the thin film causes a carrier concentration change, which affect the AZO film optoelectronic properties.
關聯: Applied Surface Science, 254(9): 2671-2677
顯示於類別:[機電工程學系] 期刊論文

文件中的檔案:

檔案 大小格式瀏覽次數
index.html0KbHTML563檢視/開啟


在NCUEIR中所有的資料項目都受到原著作權保護.

 


DSpace Software Copyright © 2002-2004  MIT &  Hewlett-Packard  /   Enhanced by   NTU Library IR team Copyright ©   - 回饋