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NCUEIR > College of Engineering > Department of Mechatronics Engineering > Periodical Articles > Item 987654321/12281

Please use this identifier to cite or link to this item: http://ir.ncue.edu.tw/ir/handle/987654321/12281

Title:	Effect of post-annealing on the optoelectronic properties of ZnO:Ga films prepared by pulsed direct current magnetronsputtering
Authors:	Wen-Tsai Yen;Yi-Cheng Lin;Pin-Chuan Yao;Jia-Hong Ke;Yung-Lin Chen
Contributors:	機電工程系
Keywords:	ZnO:Ga;Annealing;Pulsed direct current magnetron sputtering;Optoelectronic properties;Near-infrared reflective
Date:	2010-04
Issue Date:	2012-07-05T07:11:02Z
Publisher:	Elsevier B.V.
Abstract:	In this study, highly conductive films of ZnO:Ga (GZO) were deposited by pulsed direct current magnetron sputtering to explore the effect of post-annealing on the structural, electrical and optical properties of the films. XRD patterns showed that after annealing, the intensity of c-axis preferentially oriented GZO (002) peak was apparently improved. GZO film annealing at 300 °C for 0.5 h exhibits lowest resistivity of 1.36×10−4Ωcm. In addition, the film shows good optical transmittance of 88% with optical band gap, 3.82 eV. Carrier concentration and optical band gap both decreaseswith the annealing temperature. Besides, the near-infrared transmittance at 1400 nm is below 5%, while the reflectivity at 2400 nm is as high as 70%.
Relation:	Thin Solid Films, 518: 3882-3885
Appears in Collections:	[Department of Mechatronics Engineering] Periodical Articles

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