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NCUEIR > College of Engineering > Department of Mechatronics Engineering > Periodical Articles > Item 987654321/12290

Please use this identifier to cite or link to this item: http://ir.ncue.edu.tw/ir/handle/987654321/12290

Title:	Surface textured molybdenum doped zinc oxide thin films prepared for thin film solar cells using pulsed direct current magnetron sputtering
Authors:	Lin, Yi- Cheng;Wang, B. L.;Yen, W. T.;Shen, C. H.
Contributors:	機電工程系
Keywords:	Molybdenum doped zinc oxide;Surface textured;Light trapping structure;Haze value;Pulsed direct current magnetron sputtering
Date:	2011-06
Issue Date:	2012-07-05T07:11:29Z
Publisher:	Elsevier B.V.
Abstract:	In this study, we examined the effect of etching on the electrical properties, transmittance, and scattering of visible light in molybdenum doped zinc oxide, ZnO:Mo (MZO) thin films prepared by pulsed direct current magnetron sputtering. We used two different etching solutions – KOH and HCl-to alter the surface texture of the MZO thin film so that it could trap light. The experimental results showed that an MZO film with a minimum resistivity of about 8.9 × 10- 4 Ω cm and visible light transitivity of greater than 80% can be obtained without heating at a Mo content of 1.77 wt.%, sputtering power of 100 W, working pressure of 0.4 Pa, pulsed frequency of 10 kHz, and film thickness of 500 nm. To consider the effect of resistivity and optical diffuse transmittance, we performed etching of an 800 nm thick MZO thin film with 0.5 wt.% HCl for 3-6 s at 300 K. Consequently, we obtained a resistivity of 1.74-2.75 × 10- 3 Ω cm, total transmittance at visible light of 67%-73%, diffuse transmittance at visible light of 25.1%-28.4%, haze value of 0.34-0.42, and thin film surface crater diameters of 220-350 nm.
Relation:	Thin Solid Films, 519(16): 5571-5576
Appears in Collections:	[Department of Mechatronics Engineering] Periodical Articles

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