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Please use this identifier to cite or link to this item: http://ir.ncue.edu.tw/ir/handle/987654321/12306

Title: 離子源表面處理效應對於銦鍚氧化物薄膜特性影響之研究
Authors: 李智淵;吳憶麟;簡毓蒼;林義成
Contributors: 機電工程系
Date: 2005
Issue Date: 2012-07-05T07:13:12Z
Publisher: 中華民國材料協會
Relation: 中華民國材料協會年會, 台北, 台灣 
Appears in Collections:[機電工程學系] 會議論文

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