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題名: | Effect of the Polyimide Concentration on the Memory Stability of the Silica-Nanoparticle-Doped Hybrid Aligned Nematic Cell |
作者: | Huang, Chi-Yen;Chen, Jian-Hong;Hsieh, Chia-Ting;Song, Heng-Cheng;Wang, Yu-Wu;Horng, Lance;Shih, Yu-Tai;Hwang, Shug-June |
貢獻者: | 光電科技研究所 |
日期: | 2011-02
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上傳時間: | 2013-01-07T02:11:03Z
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出版者: | The Japan Society of Applied Physics |
摘要: | We investigate the stability of the memory state of the silica-nanoparticle-doped hybrid aligned nematic (SN-HAN) cell. The memory stability of the cell is attributed to the employed planar substrate, which is coated with a homogeneous polyimide (H-PI) film. A H-PI film with a low H-PI solid concentration gives the cell high memory stability. This is because the low H-PI solid concentration causes the film to have a high polar surface energy, trapping polar silica nanoparticles on the planar substrate tightly. The low H-PI solid concentration also gives the substrate a bumpy surface, which has a large surface area for trapping silica nanoparticles. |
關聯: | Jpn. J. Appl. Phys., 50(2): 021702 |
顯示於類別: | [光電科技研究所] 期刊論文
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