National Changhua University of Education Institutional Repository : Item 987654321/15333

English | 正體中文 | 简体中文 | Items with full text/Total items : 6507/11669
Visitors : 29965948 Online Users : 361

RC Version 3.2 © Powered By DSPACE, MIT. Enhanced by NTU Library IR team.

Scope Adv. Search

Login ‧ Upload ‧ Help ‧ About ‧ Administer

NCUEIR > College of Science > Department of Physics > Proceedings > Item 987654321/15333

Please use this identifier to cite or link to this item: http://ir.ncue.edu.tw/ir/handle/987654321/15333

Title:	Transport Properties of Patterned Magnetic Tunnel Junctions Using Lift-Off Method
Authors:	Wu, Kuo-Ming;Wu, J. C.;Horng, Lance
Contributors:	物理學系
Date:	2006-09
Issue Date:	2013-02-05T02:17:25Z
Publisher:	American Institute of Physics
Abstract:	We develop a new process of fabricating MTJs which avoids the short circuit of the trilayers induced by the redeposit effect in etching process. The junction structures studied were prepared by UHV DC/RF magnetron sputtering. All MTJs have the same structure: Al (60)/Co50FE50 (25)/Al + oxidation (1.2)/Ni20Fe80 (3O)/A1 (60), with all thickness given in nanometers. The thickness of AlOx correspond to the effective barrier width determined by fitting I–V curve to Simmons Equation. The magnetization hysteresis (MH) loops are measured by a SQUID system at 298K. All MR measurements are taken at 180mV with 20 × 50 (µm2) junction areas.
Relation:	AIP Conference Proceedings, 850(1): 1486-1487
Appears in Collections:	[Department of Physics] Proceedings

Files in This Item:

File	Size	Format
2020200716001.pdf	7Kb	Adobe PDF	475	View/Open