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Please use this identifier to cite or link to this item: http://ir.ncue.edu.tw/ir/handle/987654321/15783

Title: Electron Beam Lithography of Microbowtie Structures for Next-generation Optical Probe
Authors: Tseng, Ampere A.;Chen, Chii D.;Wu, Cen-Shawn;Diaz, Rodolfo E.;Watts, Michael E.
Contributors: 物理學系
Keywords: Electron-beam lithography;Microbowtie;Microfabrication;Micro/Nano;Inspection;Optical probe
Date: 2002
Issue Date: 2013-03-12T04:05:58Z
Publisher: Society of Photo-Optical Instrumentation Engineers
Abstract: The development of microbowtie structures for a next-generation optical probe called the Wave Interrogated Near-Field Array (WINFA) is presented. The WINFA combines the sensitivity of near-field detection with the speed of optical scanning. The microbowties are designed to act as resonant elements to provide spatial resolution well below the diffraction limit with a transmission efficiency approaching unity. Following an introduction of the concept and background information, the design of the microbowtie is presented. A numerical electromagnetic scattering model is developed and used for better designs of the bowtie structures. The electron-beam lithography process is then used to fabricate the final designed bowties structure. Special fabrication procedures have been developed to cope with the charge dissipation problem that arises when lithographing an insulating substrate as is required in the present probe design. Two types of substrates and two types of resists are considered in the present study. The fabricated microstructures have 40 nm bowtie gaps that are more than 200 000 times smaller than the one built previously. All fabricated bowtie microstructures are examined and the results are compared. It has been found that, in addition to the relative ease in fabrication, the bowties on indium–tin–oxide coated glass substrate can not only minimize the charge accumulation in a glass substrate, but also satisfy the functional requirement of optical transparency to the incident wave. Recommendations for making a bowtie structure in the even smaller bowtie array are also included.
Relation: Journal of Microlithography, Microfabrication, and Microsystems, 1(2): 123-135
Appears in Collections:[物理學系] 期刊論文

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