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Please use this identifier to cite or link to this item: http://ir.ncue.edu.tw/ir/handle/987654321/15809

Title: Electron-Beam Lithography of Nanostructures Using Lift-Off Process
Authors: Tseng, Ampere A.;Chen, C. D.;Wu, Cen-Shawn
Contributors: 物理學系
Date: 2002-07
Issue Date: 2013-03-12T04:06:41Z
Relation: Japan-USA Symposium on Flexible Automation, Hiroshima, Japan
Appears in Collections:[物理學系] 會議論文

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