National Changhua University of Education Institutional Repository : Item 987654321/17362
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題名: Surface Analysis of (NH4)2Sx-treated InGaN using X-ray Photoelectron Spectroscopy
作者: Lin, Yow-Jon;Lee, Ching-Ting
貢獻者: 光電科技研究所
關鍵詞: Indium compounds;Gallium compounds;III-V semiconductors;Wide band gap semiconductors;Surface composition;Surface treatment;X-ray photoelectron spectra;Surface contamination;Bonds (chemical);Ohmic contacts;Schottky barriers;Surface cleaning;Ammonium compounds;Vvacancies (crystal)
日期: 2001-09
上傳時間: 2013-10-02T08:35:30Z
出版者: IEEE
摘要: We present the surface analysis of (NH4)2Sx-treated InGaN using x-ray photoelectron spectroscopy. The native oxide and organic contamination on the InGaN surface can be removed by (NH4)2Sx surface treatment. However, the hydroxyl species present on the InGaN surface cannot be removed. Because Ga–S and In–S bonds were formed and N–S bonds were not observed, we deduce that the sulfur atoms would occupy the nitrogen-related vacancies and bond with the Ga and In atoms. The clean surface and surface state reduction caused from the (NH4)2Sx surface treatment would be useful for the formation of ohmic and Schottky contacts between the metal and InGaN layers.
關聯: Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 19(5): 1734-1738
顯示於類別:[光電科技研究所] 期刊論文

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