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題名: Changes in Surface Roughness and Work Function of Indium-tin-oxide Due to KrF Excimer Laser Irradiation
作者: Lin, Yow-Jon;Baikie, Iain D.;Chou, Wei-Yang;Lin, Shih-Ting;Chang, Hsing-Cheng;Chen, Yao-Ming;Liu, Wen-Fung
貢獻者: 光電科技研究所
關鍵詞: Indium compounds;Degenerate semiconductors;Surface roughness;Work function;X-ray photoelectron spectra;Atomic force microscopy;Surface chemistry;Laser beam effects;Dissolving;Laser materials processing;Surface cleaning;Excimer lasers
日期: 2005-09
上傳時間: 2013-10-02T08:36:24Z
出版者: American Vacuum Society
摘要: In this study, from the observed x-ray photoelectron spectroscopy and atomic force microscopy results, and Kelvin probe measurements, it is suggested that the induced indium-tin-oxide (ITO) surface chemical changes by KrF excimer laser irradiation had strong effects on the surface work function (SWF) and surface roughness of ITO. During the laser irradiation, the incorporation of O22− peroxo species or the dissolution of oxygen species near the ITO surface leads to the reduction of the surface roughness and an increase in the SWF. In addition, it is worth noting that the laser-irradiated ITO sample has an excellent stability in the SWF.
關聯: Journal of Vacuum Science and Technology A, 23(5): 1305-1308
顯示於類別:[光電科技研究所] 期刊論文


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