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NCUEIR > College of Science > Graduate Institute of Photonics Technologies > Periodical Articles > Item 987654321/17396

Please use this identifier to cite or link to this item: http://ir.ncue.edu.tw/ir/handle/987654321/17396

Title:	Optical Properties of Heavily Mg-Doped p-GaN Films Prepared by Reactive Ion Etching
Authors:	Lin, Yow-Jon;Chu, Yow-Lin;Liu, Day-Shan;Lee, Chi-Sen;Chien, Feng-Tso
Contributors:	光電科技研究所
Keywords:	GaN;Photoluminescence;Reactive ion etching;Donor-acceptor pair;Nitrogen vacancy
Date:	2006-06
Issue Date:	2013-10-02T08:36:41Z
Publisher:	The Japan Society of Applied Physics
Abstract:	The effect of the damage caused by reactive ion etching on the optical properties of heavily Mg-doped p-type GaN (p-GaN) was investigated in this study. After etching, we found that the blue luminescence (BL) is redshifted and the intensity of the redshifted BL is markedly increased at room temperature, which are attributed to the formation of the lattice disorder resulting in the domination of distant donor–acceptor pairs (DAPs) and the formation of more nitrogen-vacancy-related defects resulting in more recombination centers D responsible for DAP transition.
Relation:	Japanese Journal of Applied Physics, 45(1A): 64-66
Appears in Collections:	[Graduate Institute of Photonics Technologies] Periodical Articles

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