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Title: Changes in Surface Band Bending, Surface Work Function, and Sheet Resistance of Undoped ZnO Films Due to (NH4)2Sx Treatment
Authors: Lin, Yow-Jon;Tsai, Chia-Lung
Contributors: 光電科技研究所
Keywords: Zinc compounds;II-VI semiconductors;Wide band gap semiconductors;Semiconductor thin films;Valence bands;Work function;Surface treatment;X-ray photoelectron spectra;Photoluminescence;Bonds (chemical);Reduction (chemical);Vacancies (crystal);Surface states
Date: 2006-12
Issue Date: 2013-10-02T08:36:48Z
Publisher: American Institute of Physics
Abstract: In this study, the interaction of undoped ZnO films with (NH4)2Sx treatment have been investigated by x-ray photoelectron spectroscopy, photoluminescence, optical transmittance, and four-point probe. According to the experimental results, we find that the formation of Zn–S bonds and the reduction of oxygen vacancies (i.e., the S occupation of oxygen vacancies) near the ZnO surface might lead to an increase in the upward band bending, resulting in an increase in the sheet resistance and work function of ZnO.
Relation: Journal of Applied Physics, 100(11): 113721
Appears in Collections:[光電科技研究所] 期刊論文

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