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題名: | Effects of (NH4)2Sx Treatment on Surface Work Function and Roughness of Indium–tin-oxide |
作者: | Lin, Yow-Jon;You, Chang-Feng;Tsai, Chia-Lung |
貢獻者: | 光電科技研究所 |
關鍵詞: | Surface treatment;ITO;Work function;XPS |
日期: | 2007-02
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上傳時間: | 2013-10-02T08:36:50Z
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出版者: | Elsevier B. V. |
摘要: | In this study, the effects of an (NH4)2Sx treatment on the surface work function (SWF) and roughness of indium–tin-oxide (ITO) have been investigated. From the observed X-ray photoelectron spectroscopy results, optical transmittance measurements, atomic force microscopy measurements and four-point probe measurements, it is suggested that the surface chemical changes and an increase in the sheet resistance had strong effects on the SWF of ITO. We find that the S occupation of oxygen vacancies near the ITO surface after (NH4)2Sx treatment may result in a marked increase in the SWF and a slight increase in the surface roughness. |
關聯: | Applied Surface Science, 253(8): 3957-3961 |
顯示於類別: | [光電科技研究所] 期刊論文
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