English  |  正體中文  |  简体中文  |  全文筆數/總筆數 : 6507/11669
造訪人次 : 29713103      線上人數 : 293
RC Version 3.2 © Powered By DSPACE, MIT. Enhanced by NTU Library IR team.
搜尋範圍 進階搜尋

請使用永久網址來引用或連結此文件: http://ir.ncue.edu.tw/ir/handle/987654321/17407

題名: Effects of (NH4)2Sx Treatment on Surface Work Function and Roughness of Indium–tin-oxide
作者: Lin, Yow-Jon;You, Chang-Feng;Tsai, Chia-Lung
貢獻者: 光電科技研究所
關鍵詞: Surface treatment;ITO;Work function;XPS
日期: 2007-02
上傳時間: 2013-10-02T08:36:50Z
出版者: Elsevier B. V.
摘要: In this study, the effects of an (NH4)2Sx treatment on the surface work function (SWF) and roughness of indium–tin-oxide (ITO) have been investigated. From the observed X-ray photoelectron spectroscopy results, optical transmittance measurements, atomic force microscopy measurements and four-point probe measurements, it is suggested that the surface chemical changes and an increase in the sheet resistance had strong effects on the SWF of ITO. We find that the S occupation of oxygen vacancies near the ITO surface after (NH4)2Sx treatment may result in a marked increase in the SWF and a slight increase in the surface roughness.
關聯: Applied Surface Science, 253(8): 3957-3961
顯示於類別:[光電科技研究所] 期刊論文

文件中的檔案:

檔案 大小格式瀏覽次數
index.html0KbHTML779檢視/開啟


在NCUEIR中所有的資料項目都受到原著作權保護.

 


DSpace Software Copyright © 2002-2004  MIT &  Hewlett-Packard  /   Enhanced by   NTU Library IR team Copyright ©   - 回饋