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題名: Effects of (NH4)2Sx Treatment on Surface Work Function and Roughness of Indium–tin-oxide
作者: Lin, Yow-Jon;You, Chang-Feng;Tsai, Chia-Lung
貢獻者: 光電科技研究所
關鍵詞: Surface treatment;ITO;Work function;XPS
日期: 2007-02
上傳時間: 2013-10-02T08:36:50Z
出版者: Elsevier B. V.
摘要: In this study, the effects of an (NH4)2Sx treatment on the surface work function (SWF) and roughness of indium–tin-oxide (ITO) have been investigated. From the observed X-ray photoelectron spectroscopy results, optical transmittance measurements, atomic force microscopy measurements and four-point probe measurements, it is suggested that the surface chemical changes and an increase in the sheet resistance had strong effects on the SWF of ITO. We find that the S occupation of oxygen vacancies near the ITO surface after (NH4)2Sx treatment may result in a marked increase in the SWF and a slight increase in the surface roughness.
關聯: Applied Surface Science, 253(8): 3957-3961
顯示於類別:[光電科技研究所] 期刊論文


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