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NCUEIR > College of Science > Graduate Institute of Photonics Technologies > Periodical Articles > Item 987654321/17450

Please use this identifier to cite or link to this item: http://ir.ncue.edu.tw/ir/handle/987654321/17450

Title:	Comment on “Threshold Voltage Control of Oxide Nanowire Transistors using Nitrogen Plasma Treatment” [ Appl. Phys. Lett. 97, 203508 (2010) ]
Authors:	Lin, Yow-Jon;Tsai, Chia-Lung
Contributors:	光電科技研究所
Keywords:	Nanowires;Plasma materials processing;Semiconductor materials;Tin compounds;Transistors
Date:	2011-04
Issue Date:	2013-10-02T08:37:25Z
Publisher:	American Institute of Physics
Relation:	Applied Physics Letters, 98(17): 176101
Appears in Collections:	[Graduate Institute of Photonics Technologies] Periodical Articles

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