English  |  正體中文  |  简体中文  |  Items with full text/Total items : 6491/11663
Visitors : 24892419      Online Users : 64
RC Version 3.2 © Powered By DSPACE, MIT. Enhanced by NTU Library IR team.
Scope Adv. Search

Please use this identifier to cite or link to this item: http://ir.ncue.edu.tw/ir/handle/987654321/17499

Title: 準分子雷射照射時間對氧化銦錫表面功函數影響之研究
Authors: 陳耀銘;林祐仲;許洲維;王泳麒
Contributors: 光電科技研究所
Date: 2004-12
Issue Date: 2013-10-02T08:39:16Z
Publisher: 中華民國光電學會
Relation: 2004台灣光電科技研討會
Appears in Collections:[光電科技研究所] 會議論文

Files in This Item:

There are no files associated with this item.

All items in NCUEIR are protected by copyright, with all rights reserved.


DSpace Software Copyright © 2002-2004  MIT &  Hewlett-Packard  /   Enhanced by   NTU Library IR team Copyright ©   - Feedback