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NCUEIR > College of Technology > Department of Industrial Education and Technology > Periodical Articles > Item 987654321/1841

Please use this identifier to cite or link to this item: http://ir.ncue.edu.tw/ir/handle/987654321/1841

Title:	Design Rule and Orientation Layout for MEMS Curved Beams on Silicon
Authors:	T. Chen;Z. Liu;J. G. Korvink;U. Wallrabe
Contributors:	工業教育與技術學系
Keywords:	Compliant mechanism Large Deflection Single-Crystal Silicon (SCS) Stiffness Matrix
Date:	2010-06
Issue Date:	2010-11-15T07:13:24Z
Abstract:	An analysis method used to choose a suitable structural orientation layout for a microcompliant mechanism, which includes multi-curved-beams, is introduced, particularly, for fabricating microelectromechanical-systems (MEMS) thin-curved-beam microstructures on (100) and (111) single-crystal silicon (SCS) wafers. The achievement of a large deflection of a fabricated SCS device verifies the usability of this design rule. The orientation layouts of the device for a large deflection are restricted to a specific region. Based on the analysis method, it is better to follow a 21?? safe region between the ??100 ?? and ??110 ?? orientations in order to decrease the possibility of crystal slip failure. Using this design consideration, one can design more robust MEMS compliant mechanisms from SCS, exploiting its ideal elasticity.
Relation:	Journal of Microelectromechanical Systems, 19(3):706-714 (SCI) (DOI:10.1109/JMEMS.2010.2048416)
Appears in Collections:	[Department of Industrial Education and Technology] Periodical Articles

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