English  |  正體中文  |  简体中文  |  Items with full text/Total items : 6469/11641
Visitors : 18482143      Online Users : 55
RC Version 3.2 © Powered By DSPACE, MIT. Enhanced by NTU Library IR team.
Scope Adv. Search
LoginUploadHelpAboutAdminister

Please use this identifier to cite or link to this item: http://ir.ncue.edu.tw/ir/handle/987654321/18476

Title: Modification of Polymer Surfaces and the Fabrication of Submicron‐scale Functionalized Structures by Deep‐ultraviolet and Electron‐beam Lithography
Authors: Wybourne, M. N.;Wu, Jong-Ching;Yan, Mingdi;Cai, Sui-Xioing;Keana, John F. W.
Contributors: 物理學系
Date: 1993
Issue Date: 2014-06-06T07:16:42Z
Publisher: American Vacuum Society
Abstract: A general technique to modify polymer surfaces using N‐hydroxysuccinimide (NHS) functionalized perfluorophenyl azides (PFPAs) is presented. Thin polystyrene films are spin‐coated with a solution containing the NHS PFPA ester and are either ultraviolet (UV) photolyzed with a dosage of 10 mJ cm−2 or exposed with a 15 kV electron beam with a dosage between 1 and 75 μC cm−2. The NHS active ester groups become covalently attached to the polymer via photogenerated or electron beam generated, highly reactive nitrene intermediates derived from the PFPA. Using this technique, it is demonstrated that well‐defined surface regions can be functionalized with a minimum observable feature size of 0.5 and 0.2 μm for UV and electron‐beam exposure, respectively. Through reaction of the functionalized surfaces with primary amine‐containing reagents, biological molecules have been installed on the polymer and the activity of an immobilized enzyme has been measured.
Relation: Journal of Vacuum Science & Technology B, 11(6): 2210-2214
Appears in Collections:[物理學系] 期刊論文

Files in This Item:

File SizeFormat
2020200510004.pdf69KbAdobe PDF345View/Open


All items in NCUEIR are protected by copyright, with all rights reserved.

 


DSpace Software Copyright © 2002-2004  MIT &  Hewlett-Packard  /   Enhanced by   NTU Library IR team Copyright ©   - Feedback