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Please use this identifier to cite or link to this item:
http://ir.ncue.edu.tw/ir/handle/987654321/18487
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| Title: | Magnetic Domain Pinning in Lithographically Patterned Amorphous Magnetic Layer |
| Authors: | Wu, Jong-Ching;Huang, Ying-Wen;Chen, Bing-Mau;Wu, Te-Ho;Shieh, Han-Ping D. |
| Contributors: | 物理學系 |
| Keywords: | Magnetic domain pinning;Magneto-optical;Radial hole array;Electron beam lithograhy;Kerr microscope;Magnetic force microscope |
| Date: | 1999-03
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| Issue Date: | 2014-06-06T07:17:43Z
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| Publisher: | The Japan Society of Applied Physics |
| Abstract: | Artificial pinning sites have been fabricated for the magnetic domain pinning in perpendicular anisotropy magneto-optical (MO) thin film media. The pinning sites were radial hole array made by patterning a layer of radial gold grid on the silicon nitride (SiN) coated silicon (Si) substrate using a standard electron beam lithography. Various magnetization and demagnetization procedures were performed to investigate the magnetic domain pinning behavior. A polar Kerr microscope was used in situ to monitor the magnetic wall motion and a magnetic force microscope was employed to scan the magnetic domain structures. Magnetic domains were found to be pinned inside the hole array and resembled to the geometric shape of the holes. The coercivity in the patterned MO layer is much higher than in the unpatterned MO layer. Moreover, the coercivity in the larger pinning sites area is higher than in the smaller pinning sites area. |
| Relation: | Japanese Journal of Applied Physics, 38(3B): 1832-1834 |
| Appears in Collections: | [物理學系] 期刊論文
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