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http://ir.ncue.edu.tw/ir/handle/987654321/18523
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| 題名: | Influences of the Aspect Ratio and Film Thickness on Switching Properties of Elliptical Permalloy Elements |
| 作者: | Chang, C. C.;Chung, W. S.;Chang, Y. C.;Wu, Jong-Ching;Wei, Z. H.;Lai, M. F.;Chang, C. R. |
| 貢獻者: | 物理學系 |
| 關鍵詞: | Magnetic force microscopy (MFM);Magnetization switching;Magnetoresistance (MR);Permalloy;Single domain |
| 日期: | 2005-02
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| 上傳時間: | 2014-06-06T07:18:21Z
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| 出版者: | IEEE |
| 摘要: | The size dependence on the switching properties of microstructured Permalloy (Ni80Fe20) ellipses were investigated by magnetoresistance measurements and magnetic force microscopy. Elements with fixed short axes of 1 μm, long axes varying from 2 to 10 μm, and film thickness varying from 8 to 55 nm were fabricated by electron beam lithography through a lift-off technique. A single-domain configuration was observed in the elements with the range of aspect ratios (long/short axis) from 5 to 10. More complex domain structures appear in the lower aspect ratio and thicker samples. The switching properties show a strong dependence on the film thickness as well as the aspect ratio. The switching fields of uniform magnetization reversal increase with increasing thickness up to a critical value (24c<40 nm), whereas they decrease with increasing thickness above tc. Nevertheless, the switching fields only show weak dependency on aspect ratio. |
| 關聯: | IEEE Transactions on Magnetics, 41(2): 947-949 |
| 顯示於類別: | [物理學系] 期刊論文
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