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題名: Influences of the Aspect Ratio and Film Thickness on Switching Properties of Elliptical Permalloy Elements
作者: Chang, C. C.;Chung, W. S.;Chang, Y. C.;Wu, Jong-Ching;Wei, Z. H.;Lai, M. F.;Chang, C. R.
貢獻者: 物理學系
關鍵詞: Magnetic force microscopy (MFM);Magnetization switching;Magnetoresistance (MR);Permalloy;Single domain
日期: 2005-02
上傳時間: 2014-06-06T07:18:21Z
出版者: IEEE
摘要: The size dependence on the switching properties of microstructured Permalloy (Ni80Fe20) ellipses were investigated by magnetoresistance measurements and magnetic force microscopy. Elements with fixed short axes of 1 μm, long axes varying from 2 to 10 μm, and film thickness varying from 8 to 55 nm were fabricated by electron beam lithography through a lift-off technique. A single-domain configuration was observed in the elements with the range of aspect ratios (long/short axis) from 5 to 10. More complex domain structures appear in the lower aspect ratio and thicker samples. The switching properties show a strong dependence on the film thickness as well as the aspect ratio. The switching fields of uniform magnetization reversal increase with increasing thickness up to a critical value (24c<40 nm), whereas they decrease with increasing thickness above tc. Nevertheless, the switching fields only show weak dependency on aspect ratio.
關聯: IEEE Transactions on Magnetics, 41(2): 947-949
顯示於類別:[物理學系] 期刊論文


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