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http://ir.ncue.edu.tw/ir/handle/987654321/18524
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| Title: | Investigation on the Dynamics of Cross-Tie Walls in Elliptical Permalloy Elements |
| Authors: | Chang, Y. C.;Chang, C. C.;Hsieh, W. Z.;Lee, H. M.;Wu, Jong-Ching |
| Contributors: | 物理學系 |
| Keywords: | Cross-tie wall;Magnetic-force microscope (MFM);Magnetization switching;Magnetoresistance;Permalloy |
| Date: | 2005-02
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| Issue Date: | 2014-06-06T07:18:21Z
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| Publisher: | IEEE |
| Abstract: | The magnetization reversal of micrometer-sized permalloy ellipses having cross-tie walls was investigated by means of magnetic-force microscopy and magnetoresistance measurements. Elliptical elements were fabricated using electron-beam lithography, in which an aspect ratio from 2 to 3 and thickness of 72 nm were accordingly designed. The magnetization reversal process illustrated main wall propagation along the short axis with the external field applied in the long-axis direction, while the reversal took place through annihilation of adjacent N�el-type cores when the external field was applied in the short-axis direction. In addition, the longitudinal magnetoresistance curve showed many steps that are believed to be due to the propagation of the cross-tie wall associated with the annihilation of N�el-type cores. |
| Relation: | IEEE Transactions on Magnetics, 41(2): 959-961 |
| Appears in Collections: | [物理學系] 期刊論文
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