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题名: Investigation on the Dynamics of Cross-Tie Walls in Elliptical Permalloy Elements
作者: Chang, Y. C.;Chang, C. C.;Hsieh, W. Z.;Lee, H. M.;Wu, Jong-Ching
贡献者: 物理學系
关键词: Cross-tie wall;Magnetic-force microscope (MFM);Magnetization switching;Magnetoresistance;Permalloy
日期: 2005-02
上传时间: 2014-06-06T07:18:21Z
出版者: IEEE
摘要: The magnetization reversal of micrometer-sized permalloy ellipses having cross-tie walls was investigated by means of magnetic-force microscopy and magnetoresistance measurements. Elliptical elements were fabricated using electron-beam lithography, in which an aspect ratio from 2 to 3 and thickness of 72 nm were accordingly designed. The magnetization reversal process illustrated main wall propagation along the short axis with the external field applied in the long-axis direction, while the reversal took place through annihilation of adjacent N�el-type cores when the external field was applied in the short-axis direction. In addition, the longitudinal magnetoresistance curve showed many steps that are believed to be due to the propagation of the cross-tie wall associated with the annihilation of N�el-type cores.
關聯: IEEE Transactions on Magnetics, 41(2): 959-961
显示于类别:[物理學系] 期刊論文


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