National Changhua University of Education Institutional Repository : Item 987654321/18524
English  |  正體中文  |  简体中文  |  全文笔数/总笔数 : 6507/11669
造访人次 : 30416926      在线人数 : 376
RC Version 3.2 © Powered By DSPACE, MIT. Enhanced by NTU Library IR team.
搜寻范围 进阶搜寻

jsp.display-item.identifier=請使用永久網址來引用或連結此文件: http://ir.ncue.edu.tw/ir/handle/987654321/18524

题名: Investigation on the Dynamics of Cross-Tie Walls in Elliptical Permalloy Elements
作者: Chang, Y. C.;Chang, C. C.;Hsieh, W. Z.;Lee, H. M.;Wu, Jong-Ching
贡献者: 物理學系
关键词: Cross-tie wall;Magnetic-force microscope (MFM);Magnetization switching;Magnetoresistance;Permalloy
日期: 2005-02
上传时间: 2014-06-06T07:18:21Z
出版者: IEEE
摘要: The magnetization reversal of micrometer-sized permalloy ellipses having cross-tie walls was investigated by means of magnetic-force microscopy and magnetoresistance measurements. Elliptical elements were fabricated using electron-beam lithography, in which an aspect ratio from 2 to 3 and thickness of 72 nm were accordingly designed. The magnetization reversal process illustrated main wall propagation along the short axis with the external field applied in the long-axis direction, while the reversal took place through annihilation of adjacent N�el-type cores when the external field was applied in the short-axis direction. In addition, the longitudinal magnetoresistance curve showed many steps that are believed to be due to the propagation of the cross-tie wall associated with the annihilation of N�el-type cores.
關聯: IEEE Transactions on Magnetics, 41(2): 959-961
显示于类别:[物理學系] 期刊論文

文件中的档案:

档案 大小格式浏览次数
index.html0KbHTML547检视/开启


在NCUEIR中所有的数据项都受到原著作权保护.

 

DSpace Software Copyright © 2002-2004  MIT &  Hewlett-Packard  /   Enhanced by   NTU Library IR team Copyright ©   - 回馈