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題名: | The Irreversible Magnetization Process in Microstructured Permalloy Ellipses |
作者: | Chang, Y. C.;Chang, C. C.;Wu, Jong-Ching |
貢獻者: | 物理學系 |
關鍵詞: | Magnetic force microscopy (MFM);Magnetization switching;Magnetoresistance;Permalloy |
日期: | 2005-10
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上傳時間: | 2014-06-06T07:18:28Z
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出版者: | IEEE |
摘要: | Microstructured permalloy ellipses have been fabricated using electron-beam lithography through a lift-off process. The investigations were focused on the magnetization configurations and switching processes adopting magnetic force microscopy (MFM) and magnetoresistance (MR) measurements. An original five-vortex domain configuration of ellipse can be controlled and manipulated to become a four-vortex domain configuration by tuning the external magnetic field applied along the short-axis direction. In addition, an asymmetrical reversal process can be demonstrated on an ellipse having two- or three-vortex domain configuration, in which the switching fields are 36 Oe and 24 Oe, respectively. |
關聯: | IEEE Transactions on Magnetics, 41(10): 3742-3744 |
顯示於類別: | [物理學系] 期刊論文
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