National Changhua University of Education Institutional Repository : Item 987654321/18544
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题名: The Magnetoresistance Ratio of an MTJ Device and the Influence of Ramping DC Bias Voltage Rate Measured by Conducting Atomic Force Microscope
作者: Shu, Min-Fong;Canizo-Cabrera, A.;Hsu, Chih-Cheng;Chen, C. C.;Wu, Jong-Ching;Yang, Chao-Chen;Wu, Te-Ho
贡献者: 物理學系
关键词: Magnetic tunneling junction;Conducting atomic force microscopy;Magnetoresistance;Area-resistance
日期: 2006-09
上传时间: 2014-06-06T07:18:37Z
出版者: Elsevier
摘要: A magnetic tunneling junction (MTJ) with a structure of SiO2 20 nm/Ta 5 nm/Cu 20 nm/Ta 5 nm/NiFe 2 nm/Cu 5 nm/MnIr 10 nm/CoFe 4 nm/Al–O 1.5 nm/CoFe 4 nm/NiFe 20 nm/Ta 50 nm was measured by conducting atomic force microscopy (CAFM) to obtain I–V curves. The magnetoresistance (MR) ratio valued was determined from these I–V curves. Switching field of the free layer was obtained from hysteresis loop analysis derived by alternating gradient magnetometer (AGM). The MR ratio values were measured for several ramping DC bias voltage rates. We found that a low MR ratio was obtained with the highest ramping rate. Moreover, area-resistance (RA) value of MTJ device was also obtained.
關聯: Journal of Magnetism and Magnetic Materials, 304(1): e294-e296
显示于类别:[物理學系] 期刊論文

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