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題名: Investigation of the Cross-tie Wall Evolution by Using Magnetic Force Microscopy and Local Electrical Measurement
作者: Chang, C. C.;Chang, Y. C.;Lo, I. C.;Wu, Jong-Ching
貢獻者: 物理學系
關鍵詞: Permalloy ellipse;Cross-tie wall;MFM;Magnetoresistance
日期: 2007-03
上傳時間: 2014-06-06T07:18:46Z
出版者: Elsevier
摘要: Micron-sized permalloy ellipse was fabricated accordingly to form cross-tie walls at as-deposited state, in which the film thickness is 55 nm and the long and short axes are 4 and , respectively. Six non-magnetic current/voltage leads were patched on the ellipse to investigate the magnetization reversal. The transverse magnetoresistance (MR) curve measured with two outermost leads reveal several steps associated with the nucleation and annihilation of cross-tie walls. Probing individual segment of the ellipse makes it possible to classify the contributions of cross-tie wall to the MR. Magnetic force microscopy was utilized to confirm the evolution of cross-tie wall.
關聯: Journal of Magnetism and Magnetic Materials, 310(2) Part3: 2612-2614
顯示於類別:[物理學系] 期刊論文

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