National Changhua University of Education Institutional Repository : Item 987654321/18556
English  |  正體中文  |  简体中文  |  全文笔数/总笔数 : 6507/11669
造访人次 : 29945133      在线人数 : 469
RC Version 3.2 © Powered By DSPACE, MIT. Enhanced by NTU Library IR team.
搜寻范围 进阶搜寻

jsp.display-item.identifier=請使用永久網址來引用或連結此文件: http://ir.ncue.edu.tw/ir/handle/987654321/18556

题名: Investigation of the Cross-tie Wall Evolution by Using Magnetic Force Microscopy and Local Electrical Measurement
作者: Chang, C. C.;Chang, Y. C.;Lo, I. C.;Wu, Jong-Ching
贡献者: 物理學系
关键词: Permalloy ellipse;Cross-tie wall;MFM;Magnetoresistance
日期: 2007-03
上传时间: 2014-06-06T07:18:46Z
出版者: Elsevier
摘要: Micron-sized permalloy ellipse was fabricated accordingly to form cross-tie walls at as-deposited state, in which the film thickness is 55 nm and the long and short axes are 4 and , respectively. Six non-magnetic current/voltage leads were patched on the ellipse to investigate the magnetization reversal. The transverse magnetoresistance (MR) curve measured with two outermost leads reveal several steps associated with the nucleation and annihilation of cross-tie walls. Probing individual segment of the ellipse makes it possible to classify the contributions of cross-tie wall to the MR. Magnetic force microscopy was utilized to confirm the evolution of cross-tie wall.
關聯: Journal of Magnetism and Magnetic Materials, 310(2) Part3: 2612-2614
显示于类别:[物理學系] 期刊論文

文件中的档案:

档案 大小格式浏览次数
index.html0KbHTML526检视/开启


在NCUEIR中所有的数据项都受到原著作权保护.

 

DSpace Software Copyright © 2002-2004  MIT &  Hewlett-Packard  /   Enhanced by   NTU Library IR team Copyright ©   - 回馈