National Changhua University of Education Institutional Repository : Item 987654321/18580
English  |  正體中文  |  简体中文  |  全文笔数/总笔数 : 6507/11669
造访人次 : 30004987      在线人数 : 374
RC Version 3.2 © Powered By DSPACE, MIT. Enhanced by NTU Library IR team.
搜寻范围 进阶搜寻

jsp.display-item.identifier=請使用永久網址來引用或連結此文件: http://ir.ncue.edu.tw/ir/handle/987654321/18580

题名: Fabrication and Characterization of Microscaled On-Chip Toroidal Inductors
作者: Ou, Jun-Yu;Chen, Sen-Huei;Lee, Huang-Ming;Wu, Jong-Ching
贡献者: 物理學系
关键词: On-chip;Quality factor;Radio frequency (RF);Toroidal inductor
日期: 2009-10
上传时间: 2014-06-06T07:19:13Z
出版者: IEEE
摘要: Microscaled on-chip toroidal inductors with ultrahigh quality factor (Q-factor) at tens of gigahertz have been successfully fabricated and characterized. The toroidal inductors with various diameters and dielectric layer thickness were designed and fabricated with two sets of inclined metal bars with a ring-shaped core of SiO2 inserted in-between. The frequency-dependent Q-factor and inductance were investigated using a 50-GHz S-parameter measurement system with standard two terminal ground-signal-ground microprobes on a radio-frequency (RF) probe station. The maximum inductance increases with increasing diameter of the inductor due to the enlargement of total magnetic flux. The highest Q-factor of 183 at a frequency of 28.8 GHz was realized in the inductor with diameter of 960 mum and dielectric layers thickness of 5000 nm. In addition, the resonance frequency increases with increasing the dielectric layer thickness owing to a reduction of the parasitic capacitance.
關聯: IEEE Transactions on Magnetics, 45(10): 4767-4769
显示于类别:[物理學系] 期刊論文

文件中的档案:

档案 大小格式浏览次数
index.html0KbHTML592检视/开启


在NCUEIR中所有的数据项都受到原著作权保护.

 

DSpace Software Copyright © 2002-2004  MIT &  Hewlett-Packard  /   Enhanced by   NTU Library IR team Copyright ©   - 回馈