English  |  正體中文  |  简体中文  |  Items with full text/Total items : 6491/11663
Visitors : 24611226      Online Users : 83
RC Version 3.2 © Powered By DSPACE, MIT. Enhanced by NTU Library IR team.
Scope Adv. Search

Please use this identifier to cite or link to this item: http://ir.ncue.edu.tw/ir/handle/987654321/18619

Title: Dosage Dependent Positive/Negative-Working Electron Beam resist of Poly(methyl methacrylate) Containing Bis(perfluorophenyl) Azides
Authors: Wu, Jong-Ching;Yan, M.;Wybourne, M. N.;Keana, J. F. W.
Contributors: 物理學系
Date: 1994
Issue Date: 2014-07-01T08:03:33Z
Relation: Bulletin of the American Physical Society, 39: 706
Appears in Collections:[物理學系] 會議論文

Files in This Item:

There are no files associated with this item.

All items in NCUEIR are protected by copyright, with all rights reserved.


DSpace Software Copyright © 2002-2004  MIT &  Hewlett-Packard  /   Enhanced by   NTU Library IR team Copyright ©   - Feedback