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Title: Dosage Dependent Positive/Negative-Working Electron Beam resist of Poly(methyl methacrylate) Containing Bis(perfluorophenyl) Azides
Authors: Wu, Jong-Ching;Yan, M.;Wybourne, M. N.;Keana, J. F. W.
Contributors: 物理學系
Date: 1994
Issue Date: 2014-07-01T08:03:33Z
Relation: Bulletin of the American Physical Society, 39: 706
Appears in Collections:[Department of Physics] Proceedings

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