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|Keywords: ||Core facilities;Inductively coupled plasma reactive ion etcher;High pressure reactor;Nanofabrication|
|Issue Date: ||2014-08-06T05:03:26Z
|Abstract: ||In the first year of this three-year joint project two pieces of core facilities have been purchased and established according to the schedule. These two equipments are inductively coupled plasma reactive ion etcher (ICP RIE) for the deep etching of silicon (Alcatel AMS 100SE) and high pressure reactor equipped with FTIR for the synthesis of TiO2 tube, respectively. The former will be installed in the mid-June and the latter has been in service since this February already. |
As was defined in the joint project, the mission at National Changhua University of Education (NCUE) is focused on the nanofabrication process, in which five pieces of core facilities were proposed to enhance and compensate the fabrication capability of what have existed at NCUE. In order to facilitate and speed up the whole process, a matching fund for over 50 % of the funded budget was put into this project, namely extra 3.7 million NTD from our university (NCUE) was added on the top of the 6.8 million NTD funded from NSC.
The ICP RIE has been tested at the vender site and the best structure achieved is 40 nm diameters of silicon pillar arrays having height to diameter ratio of 4 to 10. It is believed that this key process may play an important role in the fields of MEMS and NEMS. In addition, by using the high pressure reactor equipped with FTIR pure TiO2 nanotubes have been prepared in grams quantity by treating the TiO2 anatase powder with concentrated NaOH solution at elevated temperature. Based on the progress we have made so far, we believe that a national level of nanofabrication facilities can be established in two more years.
|Relation: ||國科會計畫, 計畫編號: NSC92-2120-M018-001; 研究期間: 9208-9307|
|Appears in Collections:||[物理學系] 國科會計畫|
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