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Please use this identifier to cite or link to this item: http://ir.ncue.edu.tw/ir/handle/987654321/17450

Title: Comment on “Threshold Voltage Control of Oxide Nanowire Transistors using Nitrogen Plasma Treatment” [ Appl. Phys. Lett. 97, 203508 (2010) ]
Authors: Lin, Yow-Jon;Tsai, Chia-Lung
Contributors: 光電科技研究所
Keywords: Nanowires;Plasma materials processing;Semiconductor materials;Tin compounds;Transistors
Date: 2011-04
Issue Date: 2013-10-02T08:37:25Z
Publisher: American Institute of Physics
Relation: Applied Physics Letters, 98(17): 176101
Appears in Collections:[光電科技研究所] 期刊論文

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