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Please use this identifier to cite or link to this item: http://ir.ncue.edu.tw/ir/handle/987654321/18305

Title: Extended Depth of Field in a Projected Fringe Profilometry Using a Phase Mask
Authors: Su, Wei-Chia;Su, Wei-Hung;She, Chung-Shang
Contributors: 光電科技研究所
Date: 2009
Issue Date: 2014-04-01T04:01:27Z
Relation: Tech. Digest of MOC'09, J59
Appears in Collections:[光電科技研究所] 會議論文

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