A novel method for in-situ investigation of patterned magnetic domain structures is presented. Micron-length scales of permalloy thin film fabricated by a lift-off process using electron beam lithography were placed on the top and adjacent to an aluminum strip. A magnetic force microscope was used to take continuous images of the patterned permalloy films while an electrical current was applied in the aluminum strip, with which a magnetic field was established through the patterned permalloy films in the perpendicular and plane direction. As a result, changes of the magnetic domain structures were observed in the presence of the applied magnetic field
